Triple Heater Deposition Manipulator

This deposition manipulator was built for a pulsed laser deposition (PLD) system to facilitate high sample throughput. It features 3 identical deposition stages, each with an oxygen-resistant heater (maximum temperature 950 °C in 100 mTorr O2 partial pressure), continuous sample rotation, sample shutter and a heater lift mechanism allowing for sample transfer to the stage. The entire assembly is mounted on a differentially-pumped rotary platform, motorized and software controlled, allowing for independent control of 3 samples which are going through different stages of film growth simultaneously (heating up, film growth, cooling down).